We propose an alternative method for fabricating DOEs without RIE lag and with improved surface smoothness.
We explore the use of hexagonal grids as a new grid structure for DOE design and fabrication.
We propose a new way to fabricate multi-level DOEs by directly growing an optically transparent material on a glass substrate.
We propose an additive lithographic fabrication process to realize simultaneous micrometer and millimeter features.
We propose an etch-free additive lithographic fabriction method for versatile reflective and transmissive DOEs.